Fabrication Lab of Photonic Devices

Summary:

This lab is focused on fabrications of photonic and optoelectronic devices at micro and nano metric scales. The development of these devices is done using microelectronic planar technology and flexible electronic with thin film deposition, photolithography processes, sweet and dry etching techniques on silicon and polymers substrates. The developments of this lab are focused to give solutions to different research areas like energy, health and telecommunications, with the possibilities to provide applications for the industry and external users.

Technologies / Techniques:

Photolithographic processes by photomask, thin-film deposition, wet and dry etching.

Equipment:

• Mask aligner
• Dry etch or plasma
• Acid, base and solvent hoods
• RF sputtering
• Atomic layer deposition
• E-beam evaporator
• Spin coater
• Ultrasound bath
• Hot-plates with stir
• High-temperature furnaces with controlled atmosphere

For more information please contact:

DTI (Dirección de Tecnología e Innovación)
e-mail: direccion.tecnologica@cio.mx